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標題Title: IMPROVEMENT ON THE PHOTOCURRENT OF TITANIUM DIOXIDE FILMS BY PATTERNED SUBSTRATES
作者Authors: 謝煜弘
上傳單位Department: 光電工程系
上傳時間Date: 2009-11-25
上傳者Author: 謝煜弘
審核單位Department: 光電工程系
審核老師Teacher: 謝煜弘
檔案類型Categories: 論文Thesis
關鍵詞Keyword: Photocurrent, patterned structure
摘要Abstract: In this study, the effects of patterned substrates on the photocurrents of coated TiO2 films were investigated. The mask size include lines with width of 4 μm and space of 24 μm, and holes with diameter of 4μm and space of 24 μm. A 500 nm stainless steel film was deposited onto the patterned glass substrates as a conduction layer by RF sputtering. TiO2 films were then deposited on the conduction layer by atomic layer deposition technique. The morphologies of patterned substrates were observed by a scanning electron microscopy. The photocurrents were determined to be 59.2 μA/cm2 for plain structure, 64.5 μA/cm2 for patterned line structure with line width of 20 μm and space of 8 μm, and with 147.5 μA/cm2 for patterned hole structure with hole diameter of 17.6 μm and space of 10.5 μm.

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2009_11_fd5fb18a.pdf 296Kb pdf 455 220
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