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標題Title: EFFECTS OF SUBSTRATES ON THE PHOTOELECTROCHEMICAL PROPERTIES OF TIO2 THIN FILMS GROWN BY ATOMIC LAYER DEPOSITION
作者Authors: 謝煜弘
上傳單位Department: 光電工程系
上傳時間Date: 2009-11-25
上傳者Author: 謝煜弘
審核單位Department: 光電工程系
審核老師Teacher: 謝煜弘
檔案類型Categories: 論文Thesis
關鍵詞Keyword: SUBSTRATES,PHOTOELECTROCHEMICAL,TIO2
摘要Abstract: In this study TiO2 thin films were grown on several substrates at 400 oC by atomic layer deposition from TiCl4 and H2O precursors. The film properties were characterized by XRD patterns, SEM images and photoresponse currents. The results show that the TiO2 films grown on Ta substrates possesss a higher photocurrent than those on other substrates. The photocurrents are 70、60、30 and 11 μA/cm2 for Ta, Ti, Ni and Si substrates, respectively.

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2009_11_7922eace.pdf 315Kb pdf 451 115
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