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標題Title: AlCl3-induced crystallization of amorphous silicon thin films
作者Authors: 管鴻,李宗育..等
上傳單位Department: 光電工程系
上傳時間Date: 2009-11-27
上傳者Author: 管鴻
審核單位Department: 光電工程系
審核老師Teacher: 管鴻
檔案類型Categories: 研究生論文報告Thesis
關鍵詞Keyword: AFM,X-RAY,XPS
摘要Abstract: The crystallization of a-Si was able to be enhanced by using AlCl3 vapor. Al was supplied in the forms of vapor from AlCl3 during the deposition of the a-Si film. Crystallization was enhanced with the effect of AlCl3 so that the crystallization was completed in 5 h at 540 ℃.

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2009_11_666bd54f.ppt 1010Kb ppt 520 208
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