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標題Title: Silicon nano-crystalline structures fabricated by a sequential plasma hydrogenation and annealing technique
作者Authors: 高至誠,鄭仁傑..等
上傳單位Department: 光電工程系
上傳時間Date: 2009-11-27
上傳者Author: 高至誠
審核單位Department: 光電工程系
審核老師Teacher: 高至誠
檔案類型Categories: 論文Thesis
關鍵詞Keyword: Silicon nano-crystalline structures , sequential plasma hydrogenation and annealing technique
摘要Abstract: Nano-crystalline,porous silicon(PS) films are promising materials in the areas of optoelectronics and microelectronics due to their visible luminescence characteristics at room temperature.

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