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標題Title: THE EFFECTS OF PROCESS PARAMETERS ON THE PHOTOCURRENT OF WO3
作者Authors: 鄭錫恩,Yu-Jung..等
上傳單位Department: 光電工程系
上傳時間Date: 2009-11-27
上傳者Author: 鄭錫恩
審核單位Department: 光電工程系
審核老師Teacher: 鄭錫恩
檔案類型Categories: 論文Thesis
關鍵詞Keyword: WO3; PHOTOCURRENT
摘要Abstract: Tungsten trioxide (WO3) is a promising material as a photoelectrochemical anode for water splitting [1].
In this research, WO3 thin films were deposited onto ITO glass by radio frequency magnetron sputtering. We
changed process pressure, oxygen partial pressure and thickness of WO3 thin films to find out an optimum
sputtering condition for growth of WO3 electrodes. The relationships among the process parameters, film
structures, and photocurrent responses were explored in this study

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