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標題Title: FABRICATION OF NANOPOROUS COPPER FILMS BY SELECTIVE
作者Authors: 鄭錫恩,Bo-Jiun Yeh..等
上傳單位Department: 光電工程系
上傳時間Date: 2010-6-22
上傳者Author: 鄭錫恩
審核單位Department: 光電工程系
審核老師Teacher: 鄭錫恩
檔案類型Categories: 研討會報告Seminar Report
關鍵詞Keyword: NANOPOROUS COPPER FILMS
摘要Abstract: Nanoporous copper films were fabricated by dealloying on glass substrates. Cu-Fe alloy films and Cu conducting layer were deposited by dual e-beam evaporator. Iron was dissolved selectively from Cu-Fe alloy through electrochemical reactions. Selective dissolution of iron from Cu-Fe alloy occured at open-circuit potential of -0.3 V vs. Ag/AgCl, which leads to precipitation of porous layer of copper. The pore size was about 35 nm for Cu-20%Fe alloy. The pores size and pore density was further enhanced by vacuum annealing. After annealing, the pore size was increased to about 80 nm, and the pore density was improved by nearly 50%.

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